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Maoming Yilong Latex Products Co., LTD. (Production Base)


Contact: Wang Guangxiang

Phone : 13728228181

QQ:297050756

Email:guangxiang.wang@yilong8.cn

Address: No. 12, Anledong Road, Shuidong Town, Dianbai District, Maoming City


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Position:Home > News > Company news

What problems should we pay attention to in the daily management of clean room?
Time:2023-02-15 16:45:00 Popularity:

One, clean room notice

1. Before entering the clean room, you must inform the manager and pass basic training.
2. No smoking, eating or drinking, foreign objects (such as newspapers, magazines, pencils...) are allowed in the clean room. Etc.) Do not bring in, and it is strictly prohibited to run and talk together.
3. Before entering the clean room, please take off your shoes in the specified place, put your shoes in the shoe cabinet, your coat in the wardrobe, your personal belongings in the private cabinet, and do not place food in the cabinet.
4. To enter the clean room, please put on your mask, clean cap, clean clothes and shoe covers neatly in the changing room according to the regulations and procedures, and then wash the dust in the air cleaning room, and step on the dust carpet (on the floor of the clean room) before entering.
5. When wearing a mask, the mask should be put on the nose, with the principle of covering the mouth and nostrils, so as not to pollute the chip when breathing.
6. Tidy up your clothes and hair before wearing the dust-free clothes and cap, so as not to feel uncomfortable after wearing the dust-free clothes.
7. After grooming, wear a dust-free hat. The principles of wearing a dust-free hat are as follows:
(1) Hair must be completely covered within the cap and not exposed.
(2) Under the dust-free cap to be flat on the shoulders, put on the work clothes, the hem will not come out, bare shoulder and neck.
8. After wearing the dust-free cap properly, wear the dust-free clothes. The dust-free clothes should be suitable for inches, so as not to have pants or sleeves too short and expose the skin.
9. Wear dust-free clothes, then put on the shoe cover, pull the shoe cover and straighten the shoe cover, really cover the trouser tube.
10. When wearing gloves, avoid touching the palm and fingertips of the tentacle cover with bare hands (to prevent sodium ion contamination). After wearing gloves, place the wrist of the glove inside the sleeve to prevent pollution sources.
11. After the dust-free clothes are properly dressed, you must enter the dust-free room after being cleaned and stepping on the dust-free blanket.
12. Regardless of entering or leaving the clean room, you must take off the clean clothes in the dressing room according to the regulations. Do not do so in other areas, especially do not take off while walking in the clean room.
13. Dust-free clothes, shoe covers, etc., should be cleaned regularly. When there is damage, it should be replaced immediately.
14. Take off the dust-free suit in the reverse order as you put it on.
15. The dust-free clothes should be hung well and placed in the upper cabinet in the dressing room; Shoe covers should be placed under the hanging dust-free clothes.
16. In the small cabinet in the dressing room, no other articles shall be placed except the stipulated articles such as clean clothes.
17. Except for the stipulated paper and articles, other articles shall not be carried into the clean room.
18. Clean clothes shall not be taken out of the clean room and placed in the specified space after use.
19. Masks and gloves can be kept or reused depending on their condition.
20. Anything entering the clean room must be wiped clean with sprinkles.
21. Please inform the manager before entering any equipment and wipe it clean in a dust-free room.
22. Instruments that fail to pass the assessment are prohibited from use. In case of emergency, appropriate treatment shall be taken according to emergency treatment procedures, such as turning off the switch of water, electricity and gas.
23. Fire must not be used in the clean room to avoid accidents.

Two, clean room operation instructions

1. When handling the chip, wear non-fiber gloves and use clean tweezers to hold the chip. Do not touch the chip with fingers or anything else.
(1) If the front end of any tweezers (i.e. the captive chip end) is touched or the tweezers fall off the ground, it must be cleaned. Do not wipe the dirty tweezers with tissue or cloth.
(2) After cleaning the chip, if it is touched by fingers before the next procedure, it must be cleaned again.
(3) When placing the chip on the quartz boat and preparing to enter the furnace tube, if the tweezers used are found to be soiled or there is obvious contamination caused by tweezers on the chip, the chip must be cleaned again and the clean tweezers must be used immediately.
2. The chip must be placed in the box, covered and stored in the specified position, as far as possible not to let it exposed.
3. Avoid talking on the chip to prevent saliva from splashing on the chip. Before the chip goes into the diffusion furnace, please pay special attention to prevent the above action.
4. When removing the chip from the Carrier such as Teflon and Quartz Boat, it must be lifted vertically to avoid scratching the chip. Only when the microscope lens is away from the chip, can the chip be removed from the suction seat.
5. On the chip, if the oxide layer has been long, do not use a diamond knife to mark on the chip before sending the yellow light room.
6. During operation, hands should never be put into the cleaning sink, whether wearing gloves or not.
7. When using the chemical station or oven to process the chip, be sure to put the chip in the iron dragon crystal boat, do not use plastic box.
8. When placing the chip in the quartz boat, if the chip falls on the ground or in the hand, it must be cleaned again, and then into the oxidation furnace.
9. Do not touch the inside of the chip box. If it is touched or contaminated by broken chips, it must be cleaned again.
10. Gloves, waste paper and other miscellaneous things, do not leave on the operating table, gloves must be replaced if burnt, worn or fibers become too much.
11. Do not open unfamiliar instruments and various on-off valve control buttons or handles without instructions.
12. Please notify relevant personnel immediately of any strange smell or abnormal solution, color or sound.
13. In case of any damage to the instrument due to incorrect operation, be sure to inform the person in charge or the teacher immediately.
14. When entering and leaving the clean room, the chip box must be kept clean and wrapped with plastic wrap. No one is allowed to enter.
15. In the dust-free room, atomic pen and dust-free notebook should be used for recording. Generally, paper and pencil should not be carried into the room.

Three, yellow light area operation instructions

1 Humidity and temperature will affect the alignment work, in the yellow area should pay attention to the temperature and humidity, and should reduce the people near the alignment machine, in order to reduce the change of humidity and temperature.
2. For the chip that has not yet been exposed, the yellow light area shall not be taken out to avoid sensitization.
3. The photoresist has been properly applied, and the chips waiting for aligned exposure should be placed in an opaque blue-black crystal box with a properly closed lid.
4. When the light mask is used, it should take the edge and not touch the light mask surface. Under any condition, the chromium film of the light mask should not contact with other things to prevent scratching.
5. Avoid direct eye contact with exposure machine mercury lamp when exposing.

Four, the use of tweezers

1. After entering the laboratory, you should first wear gloves and then take tweezers to avoid contamination.
2. The chip can only be taken with clean tweezers. Once the tweezers are dropped on the ground, touched by hands, or contaminated for other reasons, they must be cleaned before being used again.
3. After use, tweezers should be placed in the specified place of each station. If tweezers are used for special process, they should be kept by themselves after use.
4. Holding tweezers should adopt the "pen holding" position to hold the chip.
5. When taking the chip, the sequence should be taken from back to front, and when putting the chip back, it should be put back from front to back, so as not to scratch the chip surface.
6. When taking the chip, the "short side" (saw head) should be placed on the front of the chip, and the "long side" (flat head) should be placed on the back of the chip. The blank part of the chip should not be hurt.
7. Do not touch the tweezers in the acid tank or D.I Water tank.
8. Tweezers can only be used for taking the chip, not for other purposes.

5. Instructions for the use of chemical drugs

1. The entry and exit of chemicals shall be registered and notified to the manager, and MSDS shall be attached at the laboratory door.
2. Before using chemicals, read the MSDS carefully and inform the manager.
3. Before acid change, you must wear acid-proof plastic skirt, acid-proof long-sleeved gloves, goggles and plastic acid-proof shoes before acid change.
4. Do not open the lid of the acid bottle arbitrarily. Lock the lid immediately after use.
5 dilute acid, remember to add acid to water, never add water to acid.
6. Do not taste any chemicals or identify medicines in containers by smell.
7. Do not shake or invert the container when it is unclear what kind of medicine is in it.
8. All chemicals must be handled in a well-ventilated or vented area.
9. Read each operation specification carefully when operating each acid solution.
10. Acids may be stored with alkalis in a storage tank with ventilation equipment, but never with organic solvents.
11. Please put the waste acid into the waste acid bucket. Do not dump it arbitrarily or mix it with organic solution.
12. Put the waste organic solution into the organic waste liquid bucket. Do not dump or pour the waste acid bucket at will.
13. Do not arbitrarily change the solution in the container.
14. Please inform the solution you want to bring into the container in advance and get permission before you bring it in. If the solution you want to bring into the container is dangerous, it must be evaluated before you bring it in.
15. Waste liquid treatment: The waste liquid can be divided into acid, alkali, hydrofluoric acid, organic acid, etc., which shall be treated separately and registered. The recycling bucket is clearly marked and contains hydrofluoric acid and other acids and bases.
16 Water leakage or acid leakage treatment: water leakage or acid leakage, in order to ensure safety, absolutely not touch with the hand, first the power switch and related valve closed, and then with a dust-free cloth or acid and base adsorber treatment, and report to the manager.

Vi. Operation of chemical workstation

1. Wear rubber gloves and masks as required during operation.
2. Do not put the plastic box into the acid tank or cleaning tank.
3. Before adding any solution, be sure to confirm the solvent in the container before adding.
4. When working in the chemical workstation, you should develop a good working posture and avoid leaning forward over the chemical tank and cleaning tank. On the one hand, this can prevent hazards and on the other hand reduce the chance of contamination.
5. When the chemical station is not operating, the person with the cover should cover it properly at any time and turn off the water switch of the cleaning tank.
6. When chemicals spill into clothes, skin, face, and eyes, rinse the splash site with water for 15 minutes, and the skin color must return to normal, and arrange emergency treatment immediately.
7. In case of chemical leakage, react quickly and deal with it appropriately. If necessary, evacuate according to the instructions.
8. The rubber gloves used on the chemical workstation should avoid touching the machine, workbench, and other appliances. Please wear clean gloves for general operation.

7. RCA Method

1.DI Water 5min
2. Cook H2SO4:H2O2=3:1 for 10~20min at 75~85℃, remove metal, organic and oil
3.DI Water 5min
4.HF:H2O 10~30sec, remove Native Oxide
5.DI Water 5min
6.NH4OH:H2O2; H2O=1:1:5 Boil for 10~20min at 75~85℃, demetallized organic
7.DI Water 5min
8.HCl:H2O2:H2O=1:1:6 for 10~20min, 75~85 ℃ deion
9.DI Water 5min
10.Spin Dry

Viii. Precautions for cleaning

1. Pour water first if there is water, and pour H2O2 last. The numerical ratio is the volume ratio.
2. Organic and acid and base must not be mixed, and the operating platform must be used separately.
3. Pour the acid and base solution into the recovery tank after cooling, and pour the glass with DI Water for 5 min.
4. Acid and alkali empty bottles are cleaned with water, and placed separately in outdoor recycling cans according to plastic bottles and glass bottles.
5. Hydrofluoric acid will corrode bones. If touched, immediately apply calcium gluconate with water, rinse with water, and seek medical attention. Encounter other acids and bases immediately with a large amount of DI Water rinse.
6. After cleaning, put the Wafer in DI Water as far as possible to avoid pollution.
7. Simple cleaning steps are 1-2-9-10; The cleaning step of SiO2 is 1-2-10; Cleaning Al with HCl:H2O=1:1.
8. Remove positive photoresistance by 1-2-10, or immersion in ACE with ultrasonic oscillation.
9. Each glass or tank has a specific solution to be filled. Etching, cleaning, electroplating and organic should never be mixed.
10. Waste liquid recovery is divided into acid, alkali, hydrofluoric acid, electroplating and organic five kinds, which are separately recovered and recorded. Before dumping, check the compatibility table of waste, and then dump



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